amorphous silicon dioxide

Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon, carbon fiber, carbon nanofibers, filaments, carbon nanotubes, SiO2, silicon-germanium, tungsten, silicon carbide, silicon nitride, silicon oxynitride, titanium nitride, and various high-k dielectrics. The CVD process is also used to produce synthetic diamonds.



Silicon dioxide

A number of forms of CVD are in wide use and are frequently referenced in the literature. These processes differ in the means by which chemical reactions are initiated (e.g., activation process) and process conditions.



silica fume ,silica fume

This section discusses the CVD processes often used for integrated circuits (ICs). Particular materials are deposited best under particular conditions.





amorphous silica, Type I.


Amorphous silica (glass) beads


The Body: Silica Structures


amorphous silica spheres


Amorphous Silica


A small amorphous silica


of amorphous silicon dioxide,


When that amorphous silica is